8" Polyurethane (PU) Cerium Oxide Polishing Pads

The Polyurethane Cerium Oxide Polishing Pad is a natural hydrophobic polyurethane material that is specifically designed for polishing critical surfaces that require high accuracy. This polishing pad has a very rapid ability to polish while generating less heat and friction compared to synthetic mats. It can also be referred to as a polishing cloth, abrasive pad, polyurethane polishing piece, cerium pad, or cerium oxide pad. This material is the preferred choice for precision optics, ophthalmic lenses, silicon wafers, and any polishing application that requires unique contours and more critical tolerances. It is suitable for polishing and finishing glass, LCD/LED substrates, precision optics, hard disks, metal, and semiconductor wafer surfaces.